Specific ongoing research projects include the following

Dr. Leung’s current research interest focused on Plasma and Ion Beam technology in microfabrication processes. Currently, the following projects are ongoing in his group.

Maskless ion beam lithography technology as candidates for next generation lithography (NGL) that will be used to produce feature sizes of 100 nm and below.

Focused ion beam (FIB) systems equipped with plasma ion sources.

Compact neutron tube with rf plasma ion source.